Technical Parameters
|
Composition |
Content |
CAS No. |
|
Pure water |
85-90% |
7732-18-5 |
|
Sodium benzoate |
0.1-0.2% |
532-32-1 |
|
Surfactant |
4-5% |
∕ |
|
Others |
4-5% |
∕ |
Product Features
1、High environmental protection level: Selective etching can be achieved without the use of organic bases such as TMAH.
2、Low production cost: Using NaOH/KOH as the etching liquid, the cost is much lower than the acid polishing and etching process.
3、High etching efficiency: Compared with the acid polishing and etching process, the battery efficiency is increased by more than 0.15%.
Product Applications
1、 This product is generally suitable for Perc and Topcon battery processes;
2、Suitable for single crystals of 210, 186, 166, and 158 specifications.
Instructions for use
1、Add an appropriate amount of alkali into the tank (1.5-4% based on KOH/NAOH volume ratio)
2、Add an appropriate amount of this product into the tank (1.0-2% based on volume ratio)
3、Warm the polishing tank liquid to 60-65°C
4、Put the silicon wafer with the back PSG removed into the polishing tank, the reaction time is 180s-250s
5、 Recommended weight loss per side: 0.24-0.30g (210 wafer source, other sources are converted in equal proportions) single and polycrystalline PERC solar cells
Precautions
1、Additives need to be stored strictly away from light.
2、When the production line is not producing, the fluid should be replenished and drained every 30 minutes. If there is no production for more than 2 hours, it is recommended to drain and refill the fluid.
3、New line debugging requires DOE design based on each process of the production line to achieve process matching, thereby maximizing efficiency. The recommended process can be referred to debugging.
